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Influence of H2 plasma treatment on field emission from diamond films

机译:H2等离子体处理对金刚石薄膜场发射的影响

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The field emission was obtained from hydrogen plasma treated diamond films. It is found that the emission increased and is not stable after hydrogen treatment. Atomic force microscopy study shows that the surface morphology of the diamond films were changed after hydrogen treatment, but the effective work function is not reduced. These results were discussed.
机译:从氢等离子体处理的金刚石膜中获得现场发射。发现排放增加,氢处理后不稳定。原子力显微镜研究表明,在氢处理后,金刚石膜的表面形态改变,但是没有减少有效的工作功能。讨论了这些结果。

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