Effects of annealing on characteristics of the ITO films

摘要

Transparent conductive ITO films deposited on glass have been widely used as electrodes of liquid crystal display and other flat panel display. It is well known that the properties of ITO films are strongly effected by depositing condition, especially for the case of the films prepared by reactive sputtering of metallic alloy (indium/tin) targets. In this paper, we present the effects of post-annealing in air and vacuum on the properties of ITO films, such as the conductivity, transparency, crystal structure and thermal stability. By post-annealing, the ITO films with good quality have been obtained, the sheet resistance is as low as 50 approximately ega@/square, the transparency as high as 95%.