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Estimating the Effects of Interface Disorder on the Thermal Boundary Resistance Using a Virtual Crystal Approximation

机译:使用虚拟晶体逼近估算界面失调对热边电阻的影响

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An analytical method is presented to estimate the effects of structural disorder on the thermal boundary resistance (TBR) between 2 materials. The current method is an extension of the diffuse mismatch model (DMM) where the interface is modeled as a virtual crystal of finite thickness with properties derived from those of the constituent materials. Using this virtual crystal extension, the predictive capabilities of the diffuse mismatch method are greatly increased with added insight into the sensitivity of materials to interface quality.
机译:提出了一种分析方法来估计结构障碍对2种材料之间的热界电阻(TBR)的影响。 电流方法是漫反射模型(DMM)的延伸,其中界面被建模为有限厚度的虚拟晶体,其具有来自组成材料的特性。 使用这种虚拟晶体扩展,大大增加了漫反射方法的预测能力,随着材料的敏感性与界面质量的敏感性增加了大大增加。

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