Dot matrix technique for generating diffraction grating patterns

摘要

This paper describes a method to produce complex 2D diffraction patterns using a computer based exposure system. Images are composed of thousands of individual diffraction gratings which are exposed onto photo resist for production with traditional embossing techniques. A unique optical technique is described that allows the machinery to run a speed sufficient to cover large areas at high resolutions with reasonable run times. Ideas for other applications at larger scales are discussed as well.