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A novel type of ultra-compact lateral-current-injection III/V photonic device integrated on SOI for electronic-photonic chip application

机译:一种新型的超紧凑横向电流注射III / V光子器件,集成在SOI上的电子光子芯片应用

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An on-chip light source plays a determinant role in the realization of integrated photonic chips for optical interconnects technology. Several integration schemes of III/V laser on SOI platform for on-chip laser application have been proposed and demonstrated. However, most of those integration approaches do not provide effective solutions for the following two problems: effective light confinement/amplification in the III/V active region; and efficient light transfer/coupling between silicon and III/V waveguide. In this paper, a novel approach to integrate an ultra-compact Lateral-Current-Injection (LCI) laser on silicon-on-insulator (SOI) platform by direct wafer bonding technique is proposed and designed. The proposed LCI device has an ultra-thin thickness of 270 nm which is ~10 times thinner than the vertical current injection laser bonded on silicon. It has a confinement factor in the active region larger than 40% for 1 μm wide III/V active waveguide, which is the highest among all the other integration schemes proposed so far. An optical vertical interconnect access to transfer light efficiently between III/V and silicon layer is designed. The design of the shortest “Optical Via” of 4 μm which gives ~100% coupling efficiency is presented.
机译:片上光源在实现光学互连技术的集成光子芯片的实现中起着决定因子作用。已经提出了几种III / V激光器对片上激光应用的III / V激光器的几种集成方案,并证明了。但是,大多数集成方法都没有为以下两个问题提供有效的解决方案:III / V活动区域的有效光限制/放大;硅和III / V波导之间的高效光传输/耦合。在本文中,提出了一种通过直接晶片键合技术对绝缘体(SOI)平台上整合超紧凑横向电流注射(LCI)激光的新方法。所提出的LCI器件的超薄厚度为270nm,比在硅上粘合的垂直电流注入激光缩短〜10倍。对于1μm宽III / v有源波导的有源区,其有源区域的限制因子是到目前为止所提出的所有其他集成方案中的最高。设计了一种光学垂直互连,以在III / V和硅层之间有效地传输光。提出了4μm的最短“光学通孔”的设计,其提供〜100%耦合效率。

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