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Analysis of material removal characteristic of hydrodynamic effect polishing with revolution-rotation condition

机译:旋转旋转条件的流体动力学抛光材料去除特性分析

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Hydrodynamic effect polishing (HEP), a non-contact polishing process, can remove the surface/subsurface damage effectively and realize the surface roughness at atomic level. However the HEP process put extremely high demand on the movement accuracy of the polishing equipment. Simulations results show movement errors of the axes will directly affect the polishing effect. There exist tiny polishing marks on the HEP processed surface, and these marks will restrict the improvement of surface quality. The movement and shape errors will cause shear stress and hydrodynamic pressure fluctuation on the workpiece surface, and then the fluctuation are duplicated on the processed surface. The fluctuation can be homogenized with the introduction of revolution movement, and then the tiny polishing marks can be depressed. Material removal characteristic of the HEP with revolution movement has been analyzed. 3D fluid dynamic simulation was conducted under different rotational and revolutionary with different polishing clearance. The analysis will give positive instructions on optimization of the HEP equipment.
机译:流体动力学效果抛光(HEP),非接触抛光过程,可以有效地去除表面/地下损伤,并在原子水平上实现表面粗糙度。然而,HEP工艺对抛光设备的运动精度进行了极高的需求。仿真结果显示轴的运动误差将直接影响抛光效果。 HEP处理表面上存在微小的抛光标记,这些标记将限制表面质量的提高。运动和形状误差将导致工件表面上的剪切应力和流体动力压力波动,然后在加工表面上复制波动。波动可以通过引入旋转运动来均化,然后可以抑制微小的抛光标记。分析了具有旋转运动的HEP的材料去除特性。 3D流体动态仿真在不同的旋转和革命性下进行,具有不同的抛光间隙。分析将提供关于HEP设备优化的积极指示。

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