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A Study on the Effect of Process Parameters on Thin NAND Flash Wafer by Multi - Beam Matrix Laser Cutting

机译:多光束矩阵激光切割工艺参数对薄NAND闪光晶片工艺参数效果的研究

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This study is designed to investigate the influence of multi-beam matrix laser cutting process on NAND Flash package quality, and find out the important process parameters of multi-beam matrix laser process are defocus amount, laser power, cutting speed and material thickness. Then use the finite element analysis software ANSYS to obtain the minimum temperature influence, stress and strain, and use Taquchi method and variance analysis (ANOVA) to find the optimal temperature combination, the optimal combination of stress and strain and its contribution degree. Finally, the reliability is tested by verification experiments, and the error is found to be within 3.638%. It is confirmed that the optimized parameter combination has high repetitiveness. It is hoped that this study can contribute to the multi-beam matrix laser cutting process.
机译:本研究旨在研究多梁矩阵激光切割过程对NAND闪存质量的影响,找出多光束矩阵激光过程的重要过程参数是散焦量,激光功率,切割速度和材料厚度。然后使用有限元分析软件ANSYS获得最低温度影响,应力和应变,并使用Taquchi方法和方差分析(ANOVA)找到最佳温度组合,应力和应变的最佳组合及其贡献程度。最后,通过验证实验测试可靠性,发现错误在3.638%以内。确认优化参数组合具有高重复性。希望该研究可以有助于多束矩阵激光切割过程。

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