A HAXPES measurement system up to 15 keV developed at BL46XU of SPring-8

摘要

In order to achieve much larger probing depth than the conventional HAXPES system of BL46XU, a HAXPES measurement system equipped with a cylindrical sector analyzer, Focus HV-CSA 300/15 has been developed, by which photoelectrons with the kinetic energy up to 15 keV can be analyzed. The Si 1s peak which comes from the buried Si wafer underneath the 60 nm SiO_2 thin films can be clearly identified in the spectra excited by the photon energy of 14 keV, indicating the much larger probing depth than the conventional HAXPES measurement with 8 keV X-ray. The total energy resolution estimated from the Au Fermi edge spectra was ~0.5 eV, which is sufficient for the chemical state analysis of materials.