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Microstructure modification of AISI1045 steel induced by high-current pulsed pseudospark electron beam

机译:高电流脉冲伪柱电子束诱导AISI1045钢的微观结构改性

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Pseudospark electron beam is a kind of high-current pulsed electron beam. It is characterized by high current (hundreds of amperes to thousands amperes), short pulse duration (hundreds of nanoseconds to thousands nanoseconds), high frequency (hundreds Hz to thousands Hz) and self-focused beam diameter (typically 0.5-5 mm), which are more favorable for metal surface treatment compared with the conventional thermal-emission electron beam diode. The pseudospark electron beam is easy to achieve high rate of beam energy rise, plasma quenching and to obtain fast and stable repetitive operation. Some unique properties of material processing applications have been induced by the pseudospark electron beam treatment. In this paper, the mechanism and microstructure modification of AISI1045 steel by pseudospark electron beam surface treatment have been investigated. Surface microstructure and chemical composition of AISI 1045 steel pre and post pseudospark electron beam treatment are investigated by using scanning electron microscope (SEM), electron back-scattered diffraction (EBSD) and transmission electron microscope (TEM). Results show that the average depth of the treated layer is several microns. The melt interface is not straight, indicating a non-uniform melting process. Besides, material's grain size is significantly reduced after pseudospark treatment, especially in sublayer. The average grain size in the sublayer is smaller than in the top-layer. The relatively finer grain size in the sublayer is attributed to the temperature-induced dynamic thermal stress fields and the highest temperature gradient in the subsurface layer instead of on the top layer. Furthermore, the amorphous phase is observed on the surface of melted layer.
机译:Pseudospark电子束是一种高电流脉冲电子束。它的特点是高电流(数百位高度为千卧位),短脉冲持续时间(数百纳秒到数千纳秒),高频(数百Hz到数千Hz)和自聚焦光束直径(通常为0.5-5毫米),与传统的热发射电子束二极管相比,这对金属表面处理更有利。伪气柱电子束易于实现高频率升高,等离子体淬火并获得快速稳定的重复操作。由Pseudospark电子束处理引起材料处理应用的一些独特性质。本文研究了伪气柱电子束表面处理的AISI1045钢的机理和微观结构改性。通过使用扫描电子显微镜(SEM),电子背散射衍射(EBSD)和透射电子显微镜(TEM)研究了AISI 1045钢前后和假柱电子束处理的表面微观结构和化学组成。结果表明,经处理层的平均深度是几微米。熔体界面不是直的,表示不均匀的熔化过程。此外,伪坐治疗后,材料的粒度明显减少,特别是在子层。子层中的平均晶粒尺寸小于顶层。子层中相对更细的粒度归因于温度诱导的动态热应力场和地下层中的最高温度梯度而不是顶层。此外,在熔化层的表面上观察到非晶相。

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