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Room Temperature Ferromagnetism In Undoped And Ni Doped In_2O_3 Thin Films

机译:室温铁磁性未掺杂和Ni掺杂IN_2O_3薄膜

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Undoped and Ni (5 at.%) doped In_2O_3 thin films were deposited on glass substrate using electron beam evaporation technique and Ni doped In_2O_3 thin films were annealed at 450°C. A systematic study was carried out on the structural, chemical and magnetic properties of the as deposited and annealed thin films. X-ray diffraction analysis revealed that all the films were cubic in structure and exhibied ferromagnetism at room temperature. The undoped In_2O_3 thin films exhibited a saturation magnetization of 24.01 emu/cm~3. Ni doped In_2O_3 thin films annealed at 450°C showed a saturation magnetization of 53.81 emu/cm~3.
机译:在使用电子束蒸发技术沉积在玻璃基板上沉积在玻璃基板上的未掺杂和Ni(5at。%)沉积在玻璃基板上,并在450℃下退火Ni掺杂In_2O_3薄膜。对沉积和退火的薄膜的结构,化学和磁性进行系统研究。 X射线衍射分析表明,所有薄膜在结构中都是立方体,在室温下展示铁磁性。未掺杂的IN_2O_3薄膜表现出24.01 emu / cm〜3的饱和磁化强度。 Ni掺杂IN_2O_3薄膜在450℃下退火,显示饱和磁化为53.81 emu / cm〜3。

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