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Growth and Electrical Properties on NLO crystal: 4-N,N-Dimethylamino 4-N-methylstilbazolium Iodide

机译:NLO晶体上的生长和电性能:4-N,N-二甲基氨基4-N-甲基苯唑鎓碘化物

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4-N,N-Dimethylamino-4-N-methylstilbazolium tosylate single crystals were grown by solution crystal growth method. The cell parameters of grown crystal have been estimated using single crystal-X-ray diffraction analysis. The variation of real (ε) and imaginary (ε) part of dielectric constants and dielectric loss were observed for different frequencies and temperatures. The ac and dc electrical conductivities and activation energy were determined for DMSI crystal using dielectric studies.
机译:通过溶液晶体生长方法生长4-N,N-二甲基氨基-4-甲基甲基苯并吡啶甲磺酸盐单晶。使用单晶-X射线衍射分析估计生长晶体的细胞参数。对于不同的频率和温度,观察到介电常数和介电损耗的真实(ε)和假想(ε)部分的变化。使用介电研究确定用于DMSI晶体的AC和DC电导率和激活能。

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