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Study of Micro Roughness Parameters and Growth Characteristics of NbC/Si Multilayer using Layer by Layer Power Spectral Density Analysis

机译:通过层功率谱密度分析研究了使用层的微粗糙度参数和NBC / Si多层的生长特性

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Analysis of atomic force microscopy data measured over extended length scale gives an opportunity to calculate power spectral density (PSD) and in turn micro roughness parameters over large spatial frequency range. The surface PSD function can be used to calculate the layer by layer PSD in the multilayer stacks. In the present study, information obtained so is used to analyze surface/interface imperfections in the NbC/Si multilayer over wide spatial frequency range using the topographic measurements by atomic force microscopy (AFM) technique. Inputs of growth characteristic obtained so have helped to grow a good quality NbC/Si multilayer as tested using reflectivity beamline on Indus-1 Synchrotron facility.
机译:通过扩展长度尺度测量的原子力显微镜数据分析给出了计算功率谱密度(PSD)的机会,并且在大的空间频率范围内递交微粗糙度参数。表面PSD函数可用于通过多层堆叠中的层PSD计算层。在本研究中,所获得的信息用于使用原子力显微镜(AFM)技术的地形测量来分析在宽空间频率范围内NBC / SI多层的表面/接口缺陷。获得的增长特性的输入使得已经有助于在Indus-1同步rotron设施上使用反射光束线上测试的优质NBC / Si多层。

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