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Characterization of Sol-gel Derived Ti-doped Tungsten Oxide Electrochromic Thin Films

机译:溶胶 - 凝胶衍生的Ti掺杂氧化钨电致变色薄膜的表征

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Ti-doped WO3 electrochromic thin films were deposited onto F-doped tin oxide (FTO) substrates using spin coating technique. The as-deposited films prepared with various concentration of titanium were annealed in air at 500°C. The effect of Ti-doping concentration on structural, surface morphology and optical properties of the films were characterized by X-ray diffractometer, scanning electron microscope and UV-VIS spectrophotometer. The results show that the crystalline of WO3 can be identified at 20 values of 24.14° corresponding to 200 orientation. In addition, It was found that the electrochromic performance of WO3 can be enhanced by small doping concentration of titanium due to structural modification of the films.
机译:使用旋涂技术将Ti掺杂的WO3电致变色薄膜沉积在F掺杂的锡氧化物(FTO)底物上。用各种浓度的钛制备的沉积薄膜在500℃下在空气中退火。通过X射线衍射仪,扫描电子显微镜和UV-VIS分光光度计表征Ti掺杂浓度对膜的结构,表面形态和光学性质的影响。结果表明,WO3的结晶可以以20值为24.14°的20值,对应于200定向。此外,发现由于薄膜的结构改性,通过小掺杂钛的掺杂浓度可以提高WO3的电致变色性能。

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