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Structural and optical properties of high Bi content GaSbBi films grown by molecular beam epitaxy

机译:分子束外延生长的高BI含量气体薄膜的结构和光学性质

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GaSb1-xBix thin films with 0 ≤ x ≤ 13% were grown by molecular beam epitaxy. The Bi content, lattice expansion and crystal structure were investigated by Rutherford backscattering spectroscopy, X-ray diffraction and transmission electron microscopy. Photoluminescence spectra of the GaSb1-xBix alloys with various Bi contents were studied at 77 K. The bandgap energy of GaSb1-xBix is decreased effectively as Bi content increasing. The PL peak energy of the 13% Bi content GaSb1-xBix is extended to 2.43 μm, indicating that GaSb1-xBix alloys has potentials in mid-infrared applications.
机译:通过分子束外延生长0≤x≤13%的Gasb1-Xbix薄膜。 Rutherford反向散射光谱,X射线衍射和透射电子显微镜研究了BI含量,晶格膨胀和晶体结构。在77k下研究了具有各种BI含量的Gasb1-Xbix合金的光致发光光谱。随着BI含量的增加,Gasb1-Xbix的带隙能量有效地降低。 13%BI含量Gasb1-xbix的PL峰值能量延伸至2.43μm,表明Gasb1-Xbix合金具有中红外应用中的电位。

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