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Microstructure development of plasma-sprayed yttria-stabilized zirconia and its effect on electrical conductivity

机译:血浆喷涂氧化钇稳定氧化锆的微观结构发展及其对电导率的影响

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4.5 mol% yttria-stabilized zirconia (YSZ) deposit was prepared by atmospheric plasma spraying (APS) using an agglomerate-sintered YSZ powder. Two samples were continuously deposited at two spray distances of 80 mm and 90 mm without intermittence during spraying. The measurement showed that the ionic conductivity of the YSZ deposit at 1000°C significantly decreased from 0.06 S/cm to 0.033 S/cm with increasing spray distance from 80 mm to 90 mm. The deposit microstructure exhibited distinct interfaces between consecutive pass layers in the deposit sprayed at long spray distance. The decrease of ionic conductivity can be ascribed to change of the bonding ratio between consecutive passes resulting from decrease of deposition temperature with the increase of spray distance.
机译:使用聚集烧结的YSZ粉末,通过大气等离子体喷涂(AP)制备4.5mol%yTTRIA稳定的氧化锆(YSZ)沉积物。在喷涂期间连续沉积两个80mm和90mm的喷射距离,在不间断的情况下连续沉积两个样品。测量表明,1000℃的YSZ沉积物的离子电导率从0.06 s / cm至0.033 s / cm的喷射距离显着降低至0.033 s / cm。沉积微观结构在长喷射距离喷涂的沉积物中的连续通道层之间表现出明显的界面。离子电导率的降低可以归因于随着喷射距离的增加而导致的连续通道之间的键合比的变化。

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