Laser plasma sources of soft X-rays and extreme ultraviolet (EUV) for technology, biomedical and metrology applications

摘要

In this paper some results of investigations concerning interaction of EUV radiation with inorganic and organic materials were presented. Samples of different materials were irradiated with a 10 Hz laser - plasma EUV source based on a gas puff target. The source was equipped with grazing incidence and multilayer collecting mirrors. The grazing incidence collector was used in experiments concerning surface modification and micromachining of different materials. The micromachining experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. For fluoropolymers, EUV radiation with fluence of 10 mJ/cm 2 was enough for efficient photo-etching. The photo-etching speed was maximal for polytetrafluoroethylene (PTFE) reaching 30nm per shot. It was shown that using such a method microstructures with high aspect ratio could be produced. Experiments connected with surface modification were performed either with organic or inorganic materials. Different kinds of surface structures were obtained depending on irradiated materials and irradiation parameters. The Mo/Si collector together with argon plasma was used for obtaining a quasi-monochromatic radiation for EUV microscopy and some metrological applications.