Fabrication and Application of MoSi{sub}2-Thin-Film Electric Heaters

摘要

Thin-film heaters made of molybdenum silicide (MoSi{sub}2) were fabricated using RF magnetron sputtering and their heating characteristics under high vacuum were evaluated. The thin film has the hexagonal crystal structure in contrast to the tetragonal one of the target material. The deposition rate was approximately 2.0 μm/h. Thin-film heaters with MoSi{sub}2 deposited outside of an alumina crucible show almost linear resistance-temperature (R-T) characteristics. At high heating temperatures above 1100°C, the heating area of MoSi{sub}2-thin film decreased owing to a reaction between MoSi{sub}2 and Pt silicide with increasing heating time. The heating characteristics of the thin-film heater can be well improved using in several ways. As ways of improvement, inserting Mothin film as a buffer between the electrode and the thin-film heater or using Mo{sub}3Si-thin film as a heating material can be prevented the decrease in heating area.