Influence of in-situ surface treatment of Ir electrode before metal-organic chemical vapor deposition of Pb(Zr0.2, Ti0.8)O3 thin films in the self-regulation window

摘要

The influence of in-situ surface treatment of Ir electrode before metal-organic chemical vapor deposition of Pb(Zr0.2Ti0.8)O3 (PZT) thin films on the self-regulation process window [constant Pb concentration in the film irrespective of the precursor input ratio (Pb/(Zr+Ti)] was investigated. The effect of the various process parameteres, such as the pre-treatment of Ir electrode, susceptor and chamber wall cleaning, and total precursor flow rate on the self-regulation window was investigated. Prevention of iridium oxide formation by Ar pre-treatment was crucial to improve ferroelectric performances of PZT films within the self-regulation process window.