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Arrangement of gold nanoparticles on rough surfaces introduced by electron irradiation with high flux

机译:用高通量引入金纳米颗粒在粗糙表面上的布置

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We have examined the growth of gold nanoparticles on roughened Si surfaces prepared by high-energy electron irradiation with high flux of 9.9 x 10~(20) e/cm~2 s. Observing size and areal distribution of particles on an electron entrance surface by transmission electron microscopy, we have found peculiar growth and array of gold nanoparticles depending on temperature and surface roughness, which is suggested to be introduced on an electron entrance surface similarly to an electron exit surface. We proposed that the electron irradiation with high flux is useful to control the various arrays of gold nanoparticles in the roughened area.
机译:我们已经研究了通过高能电子照射制备的粗糙Si表面上的金纳米颗粒的生长,高通量为9.9×10〜(20)E / cm〜2。通过透射电子显微镜观察电子入射表面上的颗粒的尺寸和面积分布,我们发现了根据温度和表面粗糙度的特殊生长和金纳米颗粒阵列,这建议在电子入口表面上与电子出口类似地引入电子入口表面上表面。我们提出具有高通量的电子照射可用于控制粗糙区域中的各种金纳米粒子阵列。

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