CHARACTERIZATION OF CHARGE STORAGE IN ALD NANOLAMINATES

摘要

Charge storage in ALD nanolaminates is characterized. In this work Al_2O_3/HfAlO/Al_2O_3 and SiO_2/HfAlO/SiO_2 nanolaminates are made on p-substrates with all-ALD processes in a single process module. A metal Hg electrode probe was used to form MIS structures for standard and stressed electrical measurements. Measurements of charge storage, its reversibility and stability were carried out. A signature of positive trapped charge under negative bias stress to the electrode and a signature of negative trapped charge under positive electrode bias stress are observed. Certain Al_2O_3/HfAlO/Al_2O_3 structures exhibit larger storage efficiency than their SiO_2/HfAlO/SiO_2 counterparts.