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Defect mediated tuning of exchange bias in IrMn/CoFe nanostructure

机译:缺陷介导的IRMN / COFE纳米结构中的交换偏压调整

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A simple nanofabrication process is introduced to tune the exchange bias in the magnetic nanostructures with a feature size below 15 nm. The IrMn/CoFe films are deposited on the porous alumina oxide (AAO) with different pore diameters from 10 to 48 nm, keeping the center-to-center distance almost the same at 60 nm, which is fabricated on Si wafers. A large enhancement in the exchange field H_(ex) (2.3 times) and the coercivity H_c (8 times) is observed in the nanostructure compared to the continuous film. The exchange field is decreased with increasing pore diameter; on the other hand H_c increases continuously with increase in pore diameter. However, the values of H_(ex) and H_c for all the exchange bias nanostructures are larger than those of the continuous film. These effects are mainly ascribed to the creation of domain walls or domains due to the pinning effect and the physical limitations that the pore size and edge-to-edge distance impose on both ferromagnetic and antiferromagnetic layers. Our results strongly support that exchange bias can be tuned by the AAO pores.
机译:引入简单的纳米制作过程以使磁性纳米结构中的交换偏压曲调,具有低于15nm的特征尺寸。 IRMN / COFE膜沉积在多孔氧化铝(AAO)上,其具有不同的孔径为10至48nm,将中心到中心距离保持在60nm的中心距离,其在Si晶片上制造。与连续膜相比,在纳米结构中观察到交换场H_(ex)(2.3次)和矫顽力H_C(8次)中的大增强。随着孔径的增加而减小交换场;另一方面,H_C随着孔径的增加而连续增加。然而,所有交换偏置纳米结构的H_(ex)和H_c的值大于连续薄膜的值。由于钉扎效应和孔径和边缘到边缘距离施加在铁磁性和反铁磁层中,这些效果主要归因于创建域壁或域的产生。我们的结果强烈支持奥岛毛孔可以调整交换偏见。

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