Low Level Dissolved Oxygen Measurement Technology

摘要

Wet wafer processing frequently specifies low levels of dissolved oxygen in ultrapure rinse waters. Monitoring dissolved oxygen in those waters requires instrumentation with dependable accuracy at low concentrations. Calibration and maintenance requirements should be minimal to assure continuous on-line surveillance of water quality. Described here is a unique combination of dissolved oxygen measurement technology and design that boosts the performance and reliability and simplifies maintenance of this specialized measurement. The theory of operation of these types of sensors as well as their benefits and limitations under various conditions are covered. Associated multi-parameter instrumentation enables the combination of dissolved oxygen with other important measurements such as resistivity, conductivity, pH and/or flowrate.