barium compounds; nanostructured materials; dielectric thin films; pulsed laser deposition; X-ray diffraction; scanning electron microscopy; surface morphology; crystallisation; permittivity; chemical analysis; microwave devices; nonlinear dielectric properties; nanostructured thin films; tunable microwave device applications; pulse laser deposition; PLD; excimer Laser; laser repetition rate; pulse laser energy; deposition rate; in situ crystallization; XRD; SEM; dielectric measurements; relaxor behavior; diffuse phase transition; tunability; figure of merit; dielectric constant; 10 Hz; 300 mJ; 200 mtorr; 650 degC; 400 mtorr; 20 min; Ba(Ti/sub 1-x/Zr/sub x/)O/sub 3/-Pt-Ti-SiO/sub 2/-Si;
机译:(Ba,Sr)TiO_3和Ba(Zr,Ti)O_3薄膜的可调谐微波器件的非线性介电性能
机译:Ba(Zr,Ti)O_3薄膜在可调微波应用中的介电性能
机译:多层Ba(Zr 0.2 sub> Ti 0.8 sub>)O 3 sub> / Ba 0.6 sub> Sr 0.4的增强电性能 sub> TiO 3 sub> / Ba(Zr 0.2 sub> Ti 0.8 sub>)O 3 sub>薄膜用于可调微波
机译:Ba(Ti,Zr)O / sub 3 /薄膜在可调微波器件中的非线性介电性能
机译:应变和缺陷对可调谐微波应用中钛酸钡锶锶薄膜介电性能的影响。
机译:具有可调谐应用的PbZr0.52Ti0.48O3 / Bi1.5Zn1.0Nb1.5O7组成层的多层薄膜
机译:(Ba,Sr)TiO3和Ba(Zr,Ti)O3薄膜在可调微波器件中的非线性介电性能