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Post-fluorination of fluoride films for VUV lithography in order to improve their optical properties

机译:Vuv光刻的氟化铝氟化铝的后氟化术以改善它们的光学性质

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Post-fluorination process that consists of ‘fluorination of F-poor areas' and ‘modification to denser structure' has been developed. This process reduces the optical losses of fluoride films and prevents the losses from increasing with elapsed time.
机译:已经开发出氟化过程,其由“F差的区域”和“修改为密度结构”组成。该过程减小了氟化物膜的光学损耗,并防止损耗随着经过的时间而增加。

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