Nanometer-Scale Scratching of Borosilicate Surface with Diamond Tip using Nanoindenter

摘要

This paper describes an investigation of the etch-mask effect of a borosilicate surface with nanoscale scratches. A novel lithography nanostructure fabrication technique is proposed that uses nanoscale scratches and wet chemical etching. The technique does not require masks. The motivation for this study was to overcome the demerits of the most commonly used photolithographic techniques.