首页> 外文会议>International Conference on Phenomena in Ionized Gases >Effects of pulse shape tailoring on the properties of a pulsed capacitively coupled radiofrequency discharge
【24h】

Effects of pulse shape tailoring on the properties of a pulsed capacitively coupled radiofrequency discharge

机译:脉冲形状对电容耦合射频放电脉冲性能的影响

获取原文

摘要

We present a study carried out on a capacitively coupled radiofrequency pulsed plasma with the aim of determining the effect of different pulse shapes on the overall discharge properties. A set of differently shaped pulses were used to generate discharges in a low pressure radiofrequency discharge and measurements of electron density, made using microwave resonance hairpin probes, and optical emission spectra, made using a spectrometer and a gated ICCD, were used to characterise the discharge. The study was carried out in a capacitively coupled radiofrequency discharge generated in a Gaseous Electronics Conference (GEC) reference reactor with gas pressure in the range of 6 - 70 Pa, radiofrequency power in the range of 1 - 100 W, and pulse duration in the range of 10 μs - 100 ms. Tailored pulses can be used to control the development of electron energy and electron density.
机译:我们提出了一种在电容耦合的射频脉冲等离子体上进行的研究,目的是确定不同脉冲形状对整体放电性能的影响。使用一组不同形状的脉冲在低压射频放电中产生放电,并使用微波共振发夹探针和使用光谱仪和门控ICCD制造的光学发射光谱来表征放电。该研究是在气态电子会议(GEC)参考电抗器中产生的电容耦合的射频放电,其气体压力在6-70Pa,射频功率范围内的范围为1-100W,脉冲持续时间范围为10μs - 100 ms。可用于控制电子能量和电子密度的发展。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号