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Non-invasive VHF monitoring of atmospheric pressure plasma

机译:大气压等离子体的非侵入性VHF监测

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This lecture presents details on how to perform non-invasive Very High Frequency (VHF) signal injection on the power line of atmospheric pressure plasma (APP). The purpose of this frequency injection is to interrogate in real-time the frequency reflection properties of plasma under varying gas and power conditions, and ultimately provide performance monitoring. The technique has evolved out of non-destructive analysis of plasma chambers and on-line analysis of semiconductor manufacturing plasma etching and axial DC magnetron sputtering systems [1]. For APP [2, 3] the measurement approach uses a sinusoidal signal that is stepped from a few MHz to a few 100 MHz with a specific resolution bandwidth. This signal is injected whilst the plasma is turned on, and travels both to the source impedance and the plasma-load. The return signal produces a superposition (vector summation) of the incident and reflected waves.
机译:本讲座介绍了有关如何在大气压等离子体(APP)的电源线上执行非侵入式非常高频(VHF)信号注射的详细信息。这种频率注射的目的是在不同的气体和功率条件下实时询问等离子体的频率反射特性,最终提供性能监测。该技术已经脱离了对等离子体室的非破坏性分析以及半导体制造等离子体蚀刻和轴向直流磁控溅射系统的在线分析[1]。对于APP [2,3]测量方法使用具有特定分辨率带宽的小于几MHz到几个100 MHz的正弦信号。将该信号注入,同样导通等离子体,并传播源阻抗和等离子体负载。返回信号产生入射和反射波的叠加(矢量求和)。

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