The development of the vacuum arc ion sources is motivated by possibilities of their application in technologies for modification of surface properties and as high-current injectors for heavy ion accelerators. The sources of such a type developed at High Current Electronics Institute provide generation of intensive pulse-periodic ion beams. The present paper deals with peculiarities of vacuum arc ion sources employed to generate beams of gas and metal ions with the controllable ratio of ions of each type in a beam. The design and parameters of the sources are presented.
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