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Mechanical property of trivalent chromium processed under plasma ion

机译:等离子体离子处理三价铬的力学性能

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The investigation was undertaken by nitrogen plasma source ion implantation and pulsed plasma nitriding process to develop the novel process as an alternative to hexavalent chromium electroplating. The surface modification of the chromium electrodeposited from trivalent bath was conducted and the comparison of the surface property with hexavalent chromium electrodeposited was made in view of hardness. The surface hardening was achieved by both of processes. Characterization of the surfaces indicated the formation of hard compound layer of chromium-nitride. The improvements in hardness as a result of nitrogen plasma would be compared with interpolated trends from data reported. The possibility of the application of the plasma-added trivalent chromium process could be reviewed as one of hexavalent chromium replacement.
机译:通过氮等离子体源离子注入和脉冲等离子体氮化过程进行了研究,以开发新方法作为六价铬电镀的替代方案。进行三价浴中电沉积的表面改性,并考虑了硬度进行了用六价铬电沉积的表面性质的比较。通过两种方法实现表面硬化。表面的表征表明了形成铬 - 氮化物的硬化合物层的形成。与氮等离子体产生的硬度的改善将与来自报告的数据的内插趋势进行比较。可以将血浆添加三价铬方法应用的可能性作为六价铬替代品之一。

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