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Comparison of tomato root distributions by minirhizotron and destructive sampling

机译:MILHIZOTRON和破坏性采样的番茄根分布比较

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Calibration of minirhizotron data against root length density (RLD) was carried out in a field trial where three drip irrigation depths: surface (RO) and subsurface, 0.20 m (RI) and 0.40 m depth (RII) and two processing tomato cultivars: 'Brigade' (CI) and 'H3044' (CII) were imposed. For each treatment three minirhizotron tubes were located at 10,37.5 and 75 cm of the way from one plant row to the next. Roots intersecting the minirizotrons walls were expressed as root length intensity (L_a) and number of roots per unit of minirhizotron wall area (JV_ra). Root length density (RLD) was calculated from core samples taken for each minirhizotron tube at two locations: near the top of the minirhizotron (BI) and 15 cm apart from it, facing the minirhizotron wall opposite the plant row (BII). Minirhizotron data were regressed against RLD obtained at BI and BII and with their respective means. The results show that for all the situations studied, better correlations were obtained when RLD was regressed withL_a than with N_ra. Also was evident that the relationship between L_a and RLD was strongly influenced by the location of soil coring. RLD was correlated with L_a trough linear and cubic equations, having the last ones higher determination coefficients.For instance at 10 cm from the plant row when values from the top layer (0-40 cm) were analysed separately, La was significantly regressed with RLD measured at BII and described by the equations: RLD = 0.5448 + 0.0071 La (R~2 = 0.51) and RLD = 0.4823 +0.0074L_a + 8x 10~(-5 ) L_a ~2 - 5 x 10~7L_a~3 (R~2 = 0.61). Under the 40 cm depth the highest coefficients of determination for the linear and cubic equations were respectively 0.47 and 0.88, found when La was regressed with RLD measured at BI. For minirhizotrons located at 75 cm from the plant row and for location BI it was possible to analyse jointly data from all depths with coefficients of determination of 0.45 and 0.59 for the linear and cubic equations respectively.
机译:校准对根长度密度(RLD)的MINIRHOTRON数据在现场试验中进行,其中三个滴灌深度:表面(RO)和地下,0.20米(RI)和0.40米深度(RII)和两种加工番茄品种:'施加了大旅(CI)和'H3044'(CII)。对于每种处理,三个Minirhozotron管位于从一个植物排到下一个植物行的10,37.5和75cm。交叉壁的根部表示为根长强度(L_A)和每单位MILHIZORN壁面积(JV_RA)的根数。从两个位置的每个Minirhizotron管所采取的核心样品计算根长度密度(RLD):在MinirhizoTron(Bi)的顶部附近,除了与植物排(BII)相对的Minirhizotron壁。 Minirhizotron数据对BI和BII获得的RLD并及其各自的方式回归。结果表明,对于所研究的所有情况,当RLD以与N_RA回归时,获得更好的相关性。显然,L_A和RLD之间的关系受到土着冠的位置的强烈影响。 RLD与L_A槽线性和立方方程相关,具有最后一个较高的确定系数。当分开分别分析来自顶层(0-40cm)的值时,从植物行距离植物行10cm的实例,LA与RLD显着回归在BII测量并由方程描述:RLD = 0.5448 + 0.0071La(R〜2 = 0.51)和RLD = 0.4823 + 0.0074L_A + 8X 10〜(-5)L_A〜2 - 5×10〜7L_A〜3(r 〜2 = 0.61)。在40cm的深度下,线性和立方方程的最高系数分别为0.47和0.88,当La以Bi测量的RLD回归时发现。对于位于距离植物行75厘米的MIRHizotrons,并且对于位置BI,可以分别分析来自确定线性和立方方程的各个深度的所有深度的共同数据。

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