MEMS Fabrication Modeling with ChISELS: A Massively Parallel 3D Level-Set Based Feature Scale Modeler

摘要

Chemical Induced Surface Evolution with Level Sets (ChlSELS) is a level-set based computer code in development at Sandia National Laboratories to model at the feature scale the evolution of surfaces of microdevices during fabrication by surface micromachining (SMM) processes. The theoretical models used and a description of the code is presented here. The initial focus of the models in ChlSELS is on low pressure chemical vapor deposition (LPCVD), one of the processes employed in Sandia National Laboratories' SUMMiT V technology, so the models employed are ballistic transport of chemical species from the reactor to the surface and surface chemistry only; all of which are designed to function in a massively parallel computational framework. An example is given here of the deposition of polysilicon from Silane (SiH_4) in a simple two-dimensional trench.