Implications of the Selectiveness of Cu Chelators on Cu~0, Cu(l)O and Cu(ll)O Powders

摘要

The time and stoichiometric ratio dependence on dissolution of Cu from Cu(I)O and Cu(II)O and metallic Cu was investigated for a series of known Cu chelators. This was monitored by ICP-OES and UV-VIS. A notable difference in the rate of reaction for Cu(I)O vs Cu(II)O was observed and the impact of a copper adduct precipitating from solution discussed as this may present a re-deposition issue for Cu surface cleaning. Additionally these chelators were found to selectively favour Cu~0 and typically showed higher solution levels of Cu when exposed to the oxides.