A process for leaching enargite with ClO~- media is presented, which can selectively remove arsenic from copper concentrates at room temperature, low reagent concentrations (0.2-0.7 M ClO~-, pH 12-12.5) and very low residence times ( < 30 min). The process is described by the following reaction: Cu_3AsS_4 + 11OH~- + 35/2 ClO~- → 3 CuO + AsO_4~(3-) + + 4SO_4~(2-) + 11/2 H_2O + 35/2 Cl~-
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