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In-situ Raman Spectroscopy on Ⅲ-Ⅴ semiconductors at high temperature in MOVPE

机译:Movpe高温下Ⅲ-Ⅳ半导体的原位拉曼光谱

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Through the implementation of a Raman spectroscopic equipment into a metalorganic vapor phase epitaxy setup (MOVPE) via optical fibers we determine surface and bulk related properties of Ⅲ-Ⅴ semiconductors in a temperature range up to 1200 K. Surface damages due to high temperature are avoided by a stabilization with gaseous group V elements which allows for reproducible measurements. The temperature dependent changes are monitored and analyzed through the change in the vibrational properties which are sensitive indicators of the sample and surface status. The results can be grouped into two categories: (ⅰ) irreversible changes with temperature (crystal quality, doping) due to sample annealing during the measuring process at high temperatures, and (ⅱ) anharmonic effects (reversible) on phonon frequencies and line widths. We show that the TO and LO-phonon shifts at high temperature can be described well including fourth order phonon decay. The maximum temperature which can be reached is at present only limited by the subscale heating system.
机译:通过以上的实施的拉曼分光装置的成经由光纤的金属有机气相外延设置(MOVPE),我们确定表面,并且由于高温的Ⅲ-Ⅴ的温度范围内达到半导体到1200个K.表面损伤散装相关的性质被避免用气态的V族元素的稳定,其允许重复的测量。通过振动性能的变化监测和分析温度依赖性变化,这是样品和表面状态敏感指标的变化。结果可分为两大类:(ⅰ)与温度由于在高温下在测量过程中样品退火,并在声子的频率和线宽(ⅱ)非谐效应(可逆)的不可逆变化(晶体质量,掺杂)。我们展示了高温下的to和lo-phonon偏移,包括第四阶声位衰减。可以达到的最大温度目前仅受亚电加热系统的限制。

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