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Chemical approach to the deposition of textured CeO_2 buffer layers based on sol gel dip coating

机译:基于溶胶凝胶浸涂的纹理CeO_2缓冲层沉积化学方法

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The widespread use of vacuum techniques for the development of coated conductors, in which buffer and superconducting (REBa_2Cu_3O_(7-δ)) layers are deposited epitaxially on a substrate, is well established in the research environment. However, obtaining uninterrupted deposition at high speed, increasing flexibility in composition and in film thickness and attaining independence of geometric constraints are areas in which many vacuum techniques will need sustained development in order to answer industrial demands. This work describes the deposition of textured CeO_2 buffer layers based on sol gel dip coating under atmospheric environment and from aqueous precursor materials. Research has been performed towards the deposition of CeO_2-buffer layers using the amorphous citrate method on sapphire substrates and Ni-W foils. Coating is performed using the dip-coating technique, which allows extension to a continuous system. The withdrawal speed and the thermal treatment have been optimised in order to obtain highly oriented (001) layers exhibiting a smooth and crack-free morphology both on ceramic and metallic substrates. From the results it was concluded that sintering atmosphere and sintering temperature play a crucial role in the growth mechanism. This study describes the structural and morphological analysis of the thin layer with special attention to the difference between ceramic and metallic substrates.
机译:对涂覆导体的发展的广泛使用真空技术,其中缓冲液和超导(REBA_2CU_3O_(7-δ))在基板上外延沉积,在研究环境中是很好的。然而,以高速获得不间断的沉积,增加组成和膜厚度的柔韧性并获得几何约束的独立性是许多真空技术需要持续发展的区域,以便应答工业需求。该工作描述了基于大气环境下的溶胶凝胶浸涂和含水前体材料沉积纹理CeO_2缓冲层的沉积。在蓝宝石衬底和Ni-W箔上使用无定形柠檬酸法进行CeO_2缓冲层的研究已经进行了研究。使用浸涂技术进行涂覆,允许延伸到连续系统。已经优化了取出速度和热处理,以获得高度取向的(001)层,在陶瓷和金属基板上表现出光滑和无裂缝形态。从结果结束,烧结气氛和烧结温度在生长机制中起着至关重要的作用。本研究描述了薄层的结构和形态学分析,特别注意陶瓷和金属基材之间的差异。

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