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High-brightness long 940-nm diode lasers with double-waveguide structure

机译:具有双波导结构的高亮度长940nm二极管激光器

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Two double-waveguide 940 nm asymmetric structures with 8 nm In_xGa_(1-x)As quantum well (x = 0.13) are presented. They consist of an active region waveguide that includes a QW and an optical trap waveguide on the n side of the active region. The second structure has a supplementary optical wall in the p - clad that further pushes the optical field from the active region and reduces the confinement factor. The nominal lengths were chosen as 2.8 mm and 4 mm and the design values for the d/gamma ratio were 0.8 μm and 1.14 μm, respectively. Devices were fabricated with 100 μm apertures and yielded threshold current densities of 0.2 kA/cm~2 and 0.17 kA/cm~2 with corresponding slope efficiencies of 0.76 W/A and 0.85 W/A. At high current levels devices presented a power saturation behavior. The highest power values were 9.7 W (rollover) and 11.5 W (CMOD), respectively.
机译:提出了两个双波导940nm不对称结构,其具有8nm in_xga_(1-x)作为量子阱(x = 0.13)。它们由有源区域波导组成,该波导包括在有源区的N侧上的QW和光学陷阱波导。第二结构具有在P - 包层中的补充光壁,其进一步从有源区推动光学场并减少限制因子。选择标称长度为2.8mm,4mm,d /γ比的设计值分别为0.8μm和1.14μm。用100μm孔制造装置,产生0.2ka / cm〜2和0.17ka / cm〜2的阈值电流密度,其斜率效率为0.76 w / a和0.85w / a。在高电流水平下,设备呈现了功率饱和行为。最高功率值分别为9.7W(翻转)和11.5W(CMOD)。

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