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Thermo-field form changes of the alloy Hf-W and adsorbed layers of Hf on W

机译:HF上合金HF-W和HF吸附层的热场形式的变化

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The simultaneously action of high electric fields F and high temperatures T on the tips from alloys Hf-W and adsorbed layers of Hf on W was studied by means of field emission microscopy. It is known that Hf is a very emission active adsorbate lowering essentially the work function Φ of W-surface. Beside that a coverage Hf on W localizes the electron emission in the regions {001} in small corporal angles by means of surface migration even without the presence of high electric field [1]. These properties of Hf-coverage on w enable to produce the effective field emission cathodes with high local current density like to Zr-W cathodes [2,3]. The thermo-field treatment of thee coverages may give a ossibility to improve the angular confinement of an electron emission. In the process of a thermo-field treatment it should be distinguished the field of a treatment F_(tr), which is determined with respect to initial annealed tip form and a final field F_(fin), which is determined after thermo-field treatment. The values of F_(fin) are always significantly more in comparison with F_(tr) as a result of a rise of the field factor β after the thermo-field treatment of the emitter.
机译:通过场发射显微镜研究,研究了高电场F和高温T对来自WH的合金HF-W和HF吸附层的高温T.众所周知,HF是非常排放的活性吸附物,基本上降低了W型表面的功函数φ。除此之外,在W上的覆盖率HF通过表面迁移在小小的人物角度下定位在区域{001}中的电子发射,即使没有高电场的存在[1]。 HF覆盖的这些性质能够产生具有高局部电流密度的有效场发射阴极,如Zr-W阴极[2,3]。 THEE覆盖物的热场处理可以具有改善电子发射的角度限制的ossible。在热场处理的过程中,应区分处理F_(TR)的领域,其相对于初始退火的尖端形式和最终场F_(FIN)确定,其在热场处理之后确定。与F_(TR)相比,F_(FIN)的值与F_(TR)相比,由于发射器的热场处理之后的场因子β的升高。

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