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DIRECT INVESTIGATIONS ON THE THERMAL UNIMOLECULAR ISOMERIZATION REACTION OF 1-PENTYL RADICALS

机译:直接研究1-戊基的热分子异构化反应

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The unimolecular isomerization reaction of the 1-pentyl radical (· CH{sub}2CH{sub}2CH{sub}2CH{sub}2CH{sub}3) to the 2-pentyl radical (CH{sub}3 CHCH{sub}2CH{sub}2CH{sub}3) has been directly investigated for the first time by laser photolysis-photoionization mass spectrometry in the temperature range 440-520 K and the pressure range 1-7 Torr in He buffer gas. 1-Pentyl radicals were generated by 193-nm photolysis of 1-chloropentane and the isomerization products, 2-pentyl radicals, were selectively ionized and detected utilizing the lower ionization potential of the 2-pentyl radical than that of the 1-pentyl radical. The rate constant was found to be in the fall-off region, and the limiting high-pressure rate constant was evaluated to be k{sub}1{sup}∞(1-pentyl→ 2-pentyl)/s{sup}-1=1.916×10{sup}10 exp(-8873/T), for 440-520 K by an RRKM/master-equation analysis including semiclassical tunneling correction. By an extrapolation using the derived RRKM model, the rate expression for a wider temperature range was also evaluated. Because of the large tunneling effect, the usual modified Arrhenius formula could not be applied as a rate expression, and the high-pressure limiting rate constant was expressed as a sum of two Arrhenius forms as k{sub}1{sup}∞/s{sup}-1= 2.432×10{sup}3 T{sup}2.324 exp(-8183/T)+ 9.111×10{sup}5 exp(-5303/T), for 300-1300 K. The RRKM calculation indicates the assumption of the high-pressure limit is valid up to 800-900 K at pressures above 1 atm of N2. The fall-off behavior of the isomerization reaction with a tight transition state is also discussed.
机译:1-戊基的单分子异构化反应(·CH {Sub} 2CH {Sub} 2CH {Sub} 2Ch {Sub} 2Ch {Sub} 3)到2-戊基 - 基团(CH {Sub} 3 ChCH {Sub}已经通过在440-520k的温度范围内的激光光解 - 光相质量光谱法和HE缓冲气体中的压力范围1-7托的激光光解 - 光相质量光谱法直接研究了2CH {亚} 2CH {Sub} 3)。通过193-nm光解产生1-戊基,1-氯环戊烷和异构化产物,2-戊基自由基产生,选择性地电离和检测,利用2-戊基的较低电离电位而不是1-戊基自由基。发现速率常数在掉落区域中,并且限制高压速率常数被评估为k {sub} 1 {sup}∞(1-宾精→2-戊基)/ s {sup} - 1 = 1.916×10 {sup} 10 exp(-8873 / t),通过RRKM / Master-arequation分析,包括半分类隧道校正的440-520 k。通过使用衍生的RRKM模型的外推,还评估了更宽温度范围的速率表达。由于隧道效果大,通常的修改的Arrhenius公式不能作为速率表达应用,并且高压限制率常数表示为两个Arrhenius形式的总和,如K {Sub} 1 {sup}∞/ s。 {sup} -1 = 2.432×10 {sup} 3 t {sup} 2.324 exp(-8183 / t)+ 9.111×10 {sup} 5 exp(-5303 / t),300-1300 k。RRKM计算表示高压极限的假设在N2的1atm以上的压力下最高可达800-900 k。还讨论了与紧度过渡状态的异构化反应的掉落行为。

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