首页> 外文会议>International Congress on Applications of Lasers and Electro-Optics >ADVANCED PRECISION LASER MARKING AND OTHER MICROELECTRONICS APPLICATIONS INCLUDING WAFER DICING, PCB DRILLING/TRIMMING AND ITO TRIMMING USING INDUSTRIAL NANO-SECOND LASERS
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ADVANCED PRECISION LASER MARKING AND OTHER MICROELECTRONICS APPLICATIONS INCLUDING WAFER DICING, PCB DRILLING/TRIMMING AND ITO TRIMMING USING INDUSTRIAL NANO-SECOND LASERS

机译:先进的精密激光标记等微电子应用,包括晶圆切割,PCB钻孔/修剪和ITO修剪,使用工业纳米第二激光器

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Marking on semiconductor devices becomes complicated and difficult because ultra-reduction of the device size is being made to increase the memory capacity and processor speed. Wafer-level package marking requires even down to 100um × 100um character height and a couple of micron marking depth. Microelectronics industry includes semiconductor devices, flat-panel display, and printed-circuit boards (PCBs). Key applications for semiconductor industry include wafer marking, dicing, and drilling for wafer and cutting for stacked memory or multi-function-chip package. Key applications for display industry include in-glass marking, transparent electrode trimming, and metal electrode trimming. Key applications for PCB industry include PCB drilling and embedded PCB trimming. Especially for wafer dicing, key issues include achieving good die strength similar as the one in mechanical dicing for patterned silicon wafer, and cutting without abrupt expansion for oxide passivation layer, grooving for low-k materials, and good cutting with clean cutting surface and no residual particles for die-attach film (DAF). As one of new and proprietary processes to get the quality and speed above-mentioned, multi-beam cutting or grooving using polygon mirror is introduced. The types of lasers for the microelectronics industry include 1064nm, 532nm, and 355nm in the wavelengths, Nd:YAG and Nd:YVO4 lasers in laser materials, and 10.6 um for CO2 lasers. In this talk, overall industry trend and new technologies for laser's microelectronics applications are briefly introduced focusing on nanosecond lasers which can create the industrial demand for quality, throughput or processing speed, and total cost.
机译:因为超减少设备尺寸的正在取得以增加存储容量和处理器速度标记上的半导体器件变得复杂和困难。晶片级封装标记需要甚至下降到100um的×100um的字符高度和一对夫妇微米标记的深度。微电子工业包括半导体器件,平板显示器,和印刷电路板(PCB)。用于半导体工业的主要应用包括晶片标记,切割,和钻探晶片和切割用于堆叠存储器或多功能芯片封装。用于显示工业的主要应用包括在玻璃标记,透明电极修整,和金属电极微调。对PCB行业的主要应用包括PCB钻孔和嵌入式PCB微调。特别是用于晶片切割,关键问题包括实现作为一个在图案化的硅晶片的机械切割类似的良好模强度,和不与氧化物钝化层突然膨胀切割,开槽用于低k材料,和良好的切削加工用干净的切割表面和无残留颗粒芯片附着膜(DAF)。随着新的和专有的过程中的一个,以获得质量和速度上述,多束切割或使用多面反射镜切槽被引入。该类型的激光微电子行业的包括1064,532nm的,并且在355nm的波长,的Nd:YAG和Nd:在激光材料YVO4激光器和10.6微米的CO2激光器。在这次讲座中,激光的微电子应用整体行业的发展趋势和新技术作了简要介绍重点纳秒激光器可以创造质量,吞吐量或处理速度,以及总成本的工业需求。

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