An advanced Tantalum Metal Powder (TaMP) for Ta-capacitor manufacturing is introduced. For production of this TaMP a new Mg-vapor reduction process similar to the one used for production of the latest HC-Starck capacitor grade Niobium metal powder is used /1/. Compared to conventional TaMP which is produced via a Na-reduction route, the advanced TaMP shows distinctive advantages such as: 1) Capability to produce ultra high charge powder in excess of 150.000 μFV/g. 2) Adjustable pore size distribution for optimisation of the capacitor impregnation process. 3) Higher purity for better electrical performance. 4) Adjustable particle morphology for improved physical and sinter body properties. 5) Improved thermal conductivity of anode body resulting in reduced ignition probability. 6) Tight particle size distribution for uniform press anodes. Detailed results illustrating the aforementioned advantages are presented in this paper. HC-Starck currently pursues a fast commercialisation of this TaMP.
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