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Diffraction grating modeling by RCWA and CM methods: diffraction efficiency synchronism studies

机译:RCWA和CM方法衍射光栅模型:衍射效率同步研究

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This contribution concentrates on modeling of diffraction processes in optical diffraction gratings (ODG). First, the approach to characterization of mechanisms and diffraction processes is briefly presented, together with the regions with typical diffraction regimes. Different types of diffraction efficiency volume phase synchronism are then described. Different situations are analyzed and compared concerning ODG of different types, different refractive index / relief modulation profiles, various modulation strengths, and incident wave polarization influence. As examples, the cases of conical and Littrow mounts are discussed in detail. As rigorous modeling tools, both rigorous coupled wave analysis, and coordinate transformation methods are used, implemented, and modified.
机译:该贡献集中在光学衍射光栅(ODG)中的衍射过程建模。首先,简要介绍机构和衍射过程的表征的方法,以及具有典型衍射制度的区域。然后描述不同类型的衍射效率体积相位同步。分析和比较不同类型,不同折射率/释放调制谱,各种调制强度和入射波极化影响的不同情况。作为示例,详细讨论了锥形和leittrow安装件的情况。作为严格的建模工具,使用严格的耦合波分析和坐标转换方法,实现和修改。

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