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Modified relation for laser-plasma electron density measurement using x-ray interferometry

机译:使用X射线干涉测量的激光等离子体电子密度测量的改进关系

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In this paper, the linear propagation of x rays in laser produced plasma is studied theoretically, with a quantum mechanical technique and the so-called V representation, where the representation transformation is made by using the potential Hamiltonian V. A modified expression relating the phase difference between the probe and the reference x ray light to the plasma electron density is derived, in which the electron density gradient and its higher-order effects are taken into account. The coupling relation between phase and amplitude of x-ray is derived, and the solutions with higher-order corrections are given. An important parameter is given, which is related to the errors of the electron density measurement using x-ray interferometry. It is depicted that providing the parameter is less then one, the x-ray interferometry can be used for the measurement of the electron density, while, the greater value of the parameter, the higher order modifications need to make.
机译:在本文中,理论上,使用量子机械技术和所谓的V表示,通过使用潜在的Hamilton V.与潜在的Hamilton V.相关阶段进行了所谓的v表示来研究激光产生等离子体中的X射线的线性传播。导出探针与参考X射线光与等离子体电子密度之间的差异,其中考虑了电子密度梯度及其高阶效应。导出X射线的相位和幅度之间的耦合关系,并给出具有高阶校正的解决方案。给出了一个重要参数,其与使用X射线干涉测量法的电子密度测量的误差有关。所描绘的是,提供参数的较少者,X射线干涉测量可以用于测量电子密度,而参数的较大值,更高阶修改需要制造。

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