THE FEASIBILITY OF USING ELECTROSTATIC TECHNOLOGY FOR DEPOSITION OF CONDUCTIVE MATERIALS

摘要

1. The challenges of Electrostatic Deposition of Conductive Dry Powder include: 1.1 Material formulation 1.2 Charge method 1.3 Transport means 1.4 Transfer mechanism 2. Conductive materials can include materials with resistivities up to 10~9 ohm-cm 3. Continued. 4. Many deposition technologies exist from the fields of Electrophtography and Electrography 4.1 Most work with insulative materials 5. Two dry powder deposition technologies stand out as being viable: 5.1 Conductive SCD 5.2 Magnetic Stylus 6. The advantages of electrostatic dry powder deposition include: 6.1 Dry powder 6.2 Speed 6.3 Scalable to wide format.