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Calculation of the optical quantities characterizing inhomogeneous thin films using a new mathematical procedure based on the matrix formalism and Drude approximation

机译:基于基于矩阵形式主义的新数学过程,计算光学量表征非均匀薄膜的光学量和磨损近似

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In this contribution a new mathematical procedure enabling us to calculate the optical quantities of the inhomogeneous thin films such as reflectance, transmittance and ellipsometric parameters will be described. This procedure is based on combining the known matrix formalism and Drude approximation. The inhomogeneous thin films is replaced by a multilayer system containing the thin films with a linear profiles of the dielectric function and different thicknesses. Every individual film of the multilayer system is described by the matrix corresponding to the Drude approximation. Using this procedure one can construct an efficient algorithm allowing to calculate the values of the optical quantities of the inhomogeneous thin films exhibiting great gradients of the refractive index profiles.
机译:在该贡献中,将描述使我们能够计算诸如反射率,透射率和椭圆形参数的非均匀薄膜的光学量的新数学程序。该过程基于组合已知的矩阵形式主义和磨损近似。不均匀的薄膜由包含薄膜的多层系统代替,该薄膜具有介电功能的线性型材和不同的厚度。多层系统的每个单独膜由对应于磨损近似的矩阵来描述。使用该过程,可以构建一种有效的算法,允许计算出呈现折射率型材的较大梯度的非均匀薄膜的光学量的值。

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