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Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings

机译:表征光学薄膜微粗糙度的程序:应用于离子束溅射真空紫外涂层

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摘要

A method for characterizing the microroughness of samples in optical coating technology is developed. Measurements over different spatial-frequency ranges are composed into a single power spectral density (PSD) covering a large bandwidth. This is followed by the extraction of characteristic parameters through fitting of the PSD to a suitable combination of theoretical models. The method allows us to combine microroughness measurements performed with different techniques, and the fitting procedure can be adapted to any behavior of a combined PSD. The method has been applied to a set of ion-beam-sputtered fluoride vacuum-UV coatings with increasing number of alternative low- and high-index layers. Conclusions about roughness development and microstructural growth are drawn.
机译:开发了一种表征光学镀膜技术中样品微观粗糙度的方法。在不同的空间频率范围内的测量被组成覆盖大带宽的单个功率谱密度(PSD)。接下来是通过将PSD拟合到理论模型的适当组合来提取特征参数。该方法使我们能够结合使用不同技术进行的微粗糙度测量,并且拟合过程可以适应组合PSD的任何行为。该方法已应用于一系列离子束溅射氟化物真空-UV涂层,其涂层中交替出现了越来越多的低折射率和高折射率层。得出有关粗糙度发展和微观结构增长的结论。

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