首页> 外文会议>MRS Meeting >ATOMIC FORCE AND ELECTRON MICROSCOPY STUDIES OF TIN DIOXIDE FILMS PREPARED FROM SOLUTIONS WITH HIGH FLUORINE CONTENT
【24h】

ATOMIC FORCE AND ELECTRON MICROSCOPY STUDIES OF TIN DIOXIDE FILMS PREPARED FROM SOLUTIONS WITH HIGH FLUORINE CONTENT

机译:用高氟含量溶液制备的二氧化锡膜的原子力和电子显微镜研究

获取原文

摘要

Atomic force microscopy and electron microscopy were used to study surface and structural properties in SnO_2:F thin films deposited by spray pyrolysis on glass at a constant substrate temperature. The influence of high levels of fluorine in the starting solution on the surface topology and morphology of thin films and correlations with electrical properties are presented in this work.
机译:原子力显微镜和电子显微镜用于在恒定衬底温度下喷雾热解沉积的SnO_2:F薄膜中的表面和结构性能。本工作中提出了在薄膜表面拓扑和形态的起始溶液中的高水平氟的影响及其与电性能的相关性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号