首页> 外文会议>World computer congress >Simulation on the Effects of Concave Corner on the Characteristics of Deep-Sub-Micron Grooved-Gate PMOSFET's
【24h】

Simulation on the Effects of Concave Corner on the Characteristics of Deep-Sub-Micron Grooved-Gate PMOSFET's

机译:浅析凹入凹入对深层微槽槽闸门PMOSFET特性的影响

获取原文

摘要

To improve the performance and reliability of Grooved Gate MOSFET's, The effects of Concave corner on characteristics of deep Sub-Micron grooved gate PMOSFET's is studied using device simulator MEDICI. The study results indicate that the concave corner of recessed gate influences device characteristics strongly. With increase of concave corner, threshold voltage increases, current drive capability becomes great and hot-carrier effect is decreased.
机译:为了提高沟槽闸门MOSFET的性能和可靠性,使用器件模拟器Medici研究了凹入凹入对深层微米沟槽PMOSFET特性的影响。研究结果表明,凹陷栅极的凹角强烈影响器件特征。随着凹形角的增加,阈值电压增加,电流驱动能力变得伟大,并且热载波效果降低。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号