Marcoporous and mesoporous silicon: new materials for microfluidic and microreaction devices

摘要

The formation of mesoporous films and macropore arrays with high aspect ratios by electrochemikcal etching of silicon electrodes in hydrofluoric acid is a well established technique, which has been applied to manufacture electronical and optical devices. Applications of this new materials in fluidic and microreaction devices, however, have not been realized so far. This work provides detailed information about proe dimensions, pore morphology, and surface conditions, which shall enable researchers from other fields to estimate the potential of porous silicon for their applications.