Molar Trends of CVOCs Post In Situ Chemical Reduction (ISCR) Application in a Daughter Compound Rich Aquifer

摘要

Background/Objectives. The site is an operating “light manufacturing” facility in New York where historic operations have resulted in shallow groundwater being impacted by chlorinated volatile organic compounds (cVOCs). The source of contamination is suspected to be a historical drain within the facility where CVOCs were primarily discharged. The contamination is expected to have spread to other rooms within the current facility where manufacturing operations are in progress. Historically, the main constituents of interest (COI) are PCE and cis-1,2 DCE that exceed the NYSDEC groundwater cleanup standards. The molar concentrations of daughter product (cis 1,2 DCE) are 3-5 times the concentrations of parent compounds (PCE and TCE) within the treatment zones. The site geology comprises primarily of silty clay with intermittent layers of sand. The saturated zone impacts ranges between 3-13 ft bgs.