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Behavior of polymeric materials and their effects on high density PWB

机译:聚合物材料的行为及其对高密度PWB的影响

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In this study, properties of some selected, representative HDI materials (dielectric and solder mask), including dimensional stability (thermal and chemical), tensile behaviors, and fracture toughness have been investigated. Experimental resultsshow that glass transition temperature of materials cured with the manufacturer recommended schedule did not reach their ultimate, alleged published values, indicating that further curing is needed. Most HDI materials are brittle at room temperature witha low strength and low elongation at failure. It has been found that the resistance to crack propagation of HDI materials is much lower than that of polymer thin films, such as Kapton, widely used in electronic products. It has also been observed thatstress-strain behaviors of partially cured materials and fully cured materials are very close at room temperature but very different at higher temperatures. Finite element analyses, however, indicate that low fracture toughness of HDI materials will notbe major cause if cracks are observed in the thermal cycling of HDI boards. Rather, it would be due to combined contribution from low strain-at-failure, strong viscoelasticity, and low fracture toughness.
机译:在该研究中,已经研究了一些所选择的代表性HDI材料(电介质和焊接掩模)的性质,包括尺寸稳定性(热和化学),拉伸行为和断裂韧性。实验结果表明,用制造商建议的时间表固化的材料的玻璃化转变温度没有达到其最终的,据称发表的价值观,表明需要进一步的固化。大多数HDI材料在室温下是脆性,并且在失效时的低强度和低伸长率。已经发现,HDI材料的裂纹繁殖的抗性远低于聚合物薄膜,例如Kapton,以电子产品广泛使用。还观察到,鉴于部分固化材料和完全固化材料的棘轮菌株行为在室温下非常接近,但在较高温度下非常不同。然而,有限元分析表明,如果在HDI板的热循环中观察到裂缝,则HDI材料的低断裂韧性将不会产生主要原因。相反,它将是由于低应变发生故障,强粘弹性和低断裂韧性的贡献。

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